WEKO3
アイテム
{"_buckets": {"deposit": "465acd04-56df-4448-a210-de1a1912de5f"}, "_deposit": {"created_by": 28, "id": "1339", "owners": [28], "pid": {"revision_id": 0, "type": "depid", "value": "1339"}, "status": "published"}, "_oai": {"id": "oai:oist.repo.nii.ac.jp:00001339", "sets": ["54"]}, "author_link": ["7755", "7753", "7757", "7754", "7756"], "item_10001_biblio_info_7": {"attribute_name": "Bibliographic Information", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2019-06-24", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "25", "bibliographicPageStart": "253701", "bibliographicVolumeNumber": "114", "bibliographic_titles": [{}, {"bibliographic_title": "Applied Physics Letters", "bibliographic_titleLang": "en"}]}]}, "item_10001_creator_3": {"attribute_name": "Author", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Iqbal, R."}], "nameIdentifiers": [{"nameIdentifier": "7753", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Matsumoto, Atsushi"}], "nameIdentifiers": [{"nameIdentifier": "7754", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Sudeepthi, A."}], "nameIdentifiers": [{"nameIdentifier": "7755", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Shen, Amy Q."}], "nameIdentifiers": [{"nameIdentifier": "7756", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Sen, A. K."}], "nameIdentifiers": [{"nameIdentifier": "7757", "nameIdentifierScheme": "WEKO"}]}]}, "item_10001_description_5": {"attribute_name": "Abstract", "attribute_value_mlt": [{"subitem_description": "The complexities involved in achieving a tailor-made evaporative deposition pattern have remained a challenge. Here, we show that the morphological pattern of drying suspension droplets can be altered by varying substrate elastic modulus E: We find that the particle spot diameter and spacing between the particles scale with substrate stiffness as ds E 0: 15 and s E 1: 23; respectively. We show that the larger spot diameter and spacing between particles on a softer substrate are attributed to a higher energy barrier U associated with stronger pinning of the contact line. The particle deposition pattern is characterized in terms of deposition index, Id; whose value is \u003c 0: 50 and \u003e 0.75 for centralized (multilayer) and uniform (monolayer) deposition patterns observed for stiffer and softer substrates, respectively. The outcome of the present study may find applications in biochemical characterization and analysis of micro-/nanoparticles.", "subitem_description_type": "Other"}]}, "item_10001_publisher_8": {"attribute_name": "Publisher", "attribute_value_mlt": [{"subitem_publisher": "AIP Publishing"}]}, "item_10001_relation_14": {"attribute_name": "DOI", "attribute_value_mlt": [{"subitem_relation_type": "isVersionOf", "subitem_relation_type_id": {"subitem_relation_type_id_text": "info:doi/10.1063/1.5097620", "subitem_relation_type_select": "DOI"}}]}, "item_10001_relation_17": {"attribute_name": "Related site", "attribute_value_mlt": [{"subitem_relation_type_id": {"subitem_relation_type_id_text": "https://aip.scitation.org/doi/full/10.1063/1.5097620", "subitem_relation_type_select": "URI"}}]}, "item_10001_rights_15": {"attribute_name": "Rights", "attribute_value_mlt": [{"subitem_rights": "© 2019 The Author(s)."}, {"subitem_rights": "This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Applied Physics Letters 114,253701(2019) and may be found at https://aip.scitation.org/doi/full/10.1063/1.5097620."}]}, "item_10001_source_id_9": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "0003-6951", "subitem_source_identifier_type": "ISSN"}, {"subitem_source_identifier": "1077-3118", "subitem_source_identifier_type": "ISSN"}]}, "item_10001_version_type_20": {"attribute_name": "Author\u0027s flag", "attribute_value_mlt": [{"subitem_version_resource": "http://purl.org/coar/version/c_ab4af688f83e57aa", "subitem_version_type": "AM"}]}, "item_files": {"attribute_name": "ファイル情報", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2020-04-03"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "APL Author\u0027s Final Version.pdf", "filesize": [{"value": "1.2 MB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_free", "mimetype": "application/pdf", "size": 1200000.0, "url": {"label": "APL Author\u0027s Final Version", "url": "https://oist.repo.nii.ac.jp/record/1339/files/APL Author\u0027s Final Version.pdf"}, "version_id": "b51853f4-577e-4f58-a6b6-b2ef19e6d874"}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Substrate stiffness affects particle distribution pattern in a drying suspension droplet", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "Substrate stiffness affects particle distribution pattern in a drying suspension droplet", "subitem_title_language": "en"}]}, "item_type_id": "10001", "owner": "28", "path": ["54"], "permalink_uri": "https://oist.repo.nii.ac.jp/records/1339", "pubdate": {"attribute_name": "公開日", "attribute_value": "2020-04-02"}, "publish_date": "2020-04-02", "publish_status": "0", "recid": "1339", "relation": {}, "relation_version_is_last": true, "title": ["Substrate stiffness affects particle distribution pattern in a drying suspension droplet"], "weko_shared_id": 28}
Substrate stiffness affects particle distribution pattern in a drying suspension droplet
https://oist.repo.nii.ac.jp/records/1339
https://oist.repo.nii.ac.jp/records/13399927ce0f-8965-45b0-9e13-c625bf9c2224
名前 / ファイル | ライセンス | アクション |
---|---|---|
APL Author's Final Version (1.2 MB)
|
|
Item type | 学術雑誌論文 / Journal Article(1) | |||||
---|---|---|---|---|---|---|
公開日 | 2020-04-02 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Substrate stiffness affects particle distribution pattern in a drying suspension droplet | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者(英) |
Iqbal, R.
× Iqbal, R.× Matsumoto, Atsushi× Sudeepthi, A.× Shen, Amy Q.× Sen, A. K. |
|||||
書誌情報 |
en : Applied Physics Letters 巻 114, 号 25, p. 253701, 発行日 2019-06-24 |
|||||
抄録 | ||||||
内容記述タイプ | Other | |||||
内容記述 | The complexities involved in achieving a tailor-made evaporative deposition pattern have remained a challenge. Here, we show that the morphological pattern of drying suspension droplets can be altered by varying substrate elastic modulus E: We find that the particle spot diameter and spacing between the particles scale with substrate stiffness as ds E 0: 15 and s E 1: 23; respectively. We show that the larger spot diameter and spacing between particles on a softer substrate are attributed to a higher energy barrier U associated with stronger pinning of the contact line. The particle deposition pattern is characterized in terms of deposition index, Id; whose value is < 0: 50 and > 0.75 for centralized (multilayer) and uniform (monolayer) deposition patterns observed for stiffer and softer substrates, respectively. The outcome of the present study may find applications in biochemical characterization and analysis of micro-/nanoparticles. | |||||
出版者 | ||||||
出版者 | AIP Publishing | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0003-6951 | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 1077-3118 | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | info:doi/10.1063/1.5097620 | |||||
権利 | ||||||
権利情報 | © 2019 The Author(s). | |||||
権利 | ||||||
権利情報 | This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Applied Physics Letters 114,253701(2019) and may be found at https://aip.scitation.org/doi/full/10.1063/1.5097620. | |||||
関連サイト | ||||||
識別子タイプ | URI | |||||
関連識別子 | https://aip.scitation.org/doi/full/10.1063/1.5097620 | |||||
著者版フラグ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa |